Abstract
We report a simple method for fabricating quartz molds with submicrometer- and nanoscaled surface structures. It utilizes an excimer laser as the energy source and a roller-type contact-printing setup for directly transferring a patterned metallic thin film from a silicon mold to a quartz substrate. The transferred metallic patterns are subsequently used as an etching mask for dry etching on the quartz plate. Experiments have been carried out to determine the optimal parameters for successful pattern transformation. Experimental results on fabricating quartz molds are presented, and potential applications of this innovative pattern transformation method are addressed.
| Original language | English |
|---|---|
| Article number | 033006 |
| Journal | Journal of Micro/Nanolithography, MEMS, and MOEMS |
| Volume | 7 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - 2008 Jan 1 |
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All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Mechanical Engineering
- Electrical and Electronic Engineering
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Fabrication of quartz mold with submicrometer features based on laser-assisted contact transfer method. / Lee, Yung-Chun; Chen, Chun Hsiang; Chiu, Cheng Yu; Chang, Fuh Yu.
In: Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 7, No. 3, 033006, 01.01.2008.Research output: Contribution to journal › Article
TY - JOUR
T1 - Fabrication of quartz mold with submicrometer features based on laser-assisted contact transfer method
AU - Lee, Yung-Chun
AU - Chen, Chun Hsiang
AU - Chiu, Cheng Yu
AU - Chang, Fuh Yu
PY - 2008/1/1
Y1 - 2008/1/1
N2 - We report a simple method for fabricating quartz molds with submicrometer- and nanoscaled surface structures. It utilizes an excimer laser as the energy source and a roller-type contact-printing setup for directly transferring a patterned metallic thin film from a silicon mold to a quartz substrate. The transferred metallic patterns are subsequently used as an etching mask for dry etching on the quartz plate. Experiments have been carried out to determine the optimal parameters for successful pattern transformation. Experimental results on fabricating quartz molds are presented, and potential applications of this innovative pattern transformation method are addressed.
AB - We report a simple method for fabricating quartz molds with submicrometer- and nanoscaled surface structures. It utilizes an excimer laser as the energy source and a roller-type contact-printing setup for directly transferring a patterned metallic thin film from a silicon mold to a quartz substrate. The transferred metallic patterns are subsequently used as an etching mask for dry etching on the quartz plate. Experiments have been carried out to determine the optimal parameters for successful pattern transformation. Experimental results on fabricating quartz molds are presented, and potential applications of this innovative pattern transformation method are addressed.
UR - http://www.scopus.com/inward/record.url?scp=80055044479&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=80055044479&partnerID=8YFLogxK
U2 - 10.1117/1.2970146
DO - 10.1117/1.2970146
M3 - Article
VL - 7
JO - Journal of Micro/ Nanolithography, MEMS, and MOEMS
JF - Journal of Micro/ Nanolithography, MEMS, and MOEMS
SN - 1932-5150
IS - 3
M1 - 033006
ER -