Abstract
We report a simple method for fabricating quartz molds with submicrometer- and nanoscaled surface structures. It utilizes an excimer laser as the energy source and a roller-type contact-printing setup for directly transferring a patterned metallic thin film from a silicon mold to a quartz substrate. The transferred metallic patterns are subsequently used as an etching mask for dry etching on the quartz plate. Experiments have been carried out to determine the optimal parameters for successful pattern transformation. Experimental results on fabricating quartz molds are presented, and potential applications of this innovative pattern transformation method are addressed.
Original language | English |
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Article number | 033006 |
Journal | Journal of Micro/Nanolithography, MEMS, and MOEMS |
Volume | 7 |
Issue number | 3 |
DOIs | |
Publication status | Published - 2008 Jan 1 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Mechanical Engineering
- Electrical and Electronic Engineering