TY - GEN
T1 - Fabrication of seamless patterns onto metal rollers by photolithography
AU - Chen, Hong Wei
AU - Lee, Yung-Chun
AU - Hsiao, Fei Bin
PY - 2010/11/29
Y1 - 2010/11/29
N2 - This paper develops a novel method to fabricate seamless and complicated patterns of microstructures onto the cylindrical surface of a metal roller. This patterned metal roller can then serve as a roller mold in roll-to-roll (R2R) continuous roller imprinting of microstructures at low-cost, high-speed, and large-area. The first step towards fabricating a seamless roller mold is a pneumatically driven and self-spinning coating method and system which can uniformly spin-coat a smooth thin photo-resist (PR) layer on the cylindrical surface of a roller. After the PR coating, a UV exposure system which consists of a UV light source, a mask, and a rotary mechanism is setup up so that the PR coating is exposed in a step-and-rotate manner. Finally the exposed PR on the surface of roller can be developed and then the metal roller can be chemically etched, similar to standard process in conventional photolithography. That completes the fabrication of seamless roller molds. A number of seamless roller molds with different patterns of microstructures have been successfully fabricated. Potential developments and possible applications are under investigation.
AB - This paper develops a novel method to fabricate seamless and complicated patterns of microstructures onto the cylindrical surface of a metal roller. This patterned metal roller can then serve as a roller mold in roll-to-roll (R2R) continuous roller imprinting of microstructures at low-cost, high-speed, and large-area. The first step towards fabricating a seamless roller mold is a pneumatically driven and self-spinning coating method and system which can uniformly spin-coat a smooth thin photo-resist (PR) layer on the cylindrical surface of a roller. After the PR coating, a UV exposure system which consists of a UV light source, a mask, and a rotary mechanism is setup up so that the PR coating is exposed in a step-and-rotate manner. Finally the exposed PR on the surface of roller can be developed and then the metal roller can be chemically etched, similar to standard process in conventional photolithography. That completes the fabrication of seamless roller molds. A number of seamless roller molds with different patterns of microstructures have been successfully fabricated. Potential developments and possible applications are under investigation.
UR - http://www.scopus.com/inward/record.url?scp=78649300258&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=78649300258&partnerID=8YFLogxK
U2 - 10.1109/NEMS.2010.5592123
DO - 10.1109/NEMS.2010.5592123
M3 - Conference contribution
AN - SCOPUS:78649300258
SN - 9781424465439
T3 - 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
SP - 887
EP - 892
BT - 2010 IEEE 5th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
T2 - 5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010
Y2 - 20 January 2010 through 23 January 2010
ER -