Fabrication of silicon dioxide by photo-chemical vapor deposition to decrease detector current of ZnO ultraviolet photodetectors

Sheng Joue Young, Yi Hsing Liu, Shoou Jinn Chang, Chieh Fei Chiu

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

Zinc oxide (ZnO)-based semiconductor is a promising application for ultraviolet photodetectors (UV PDs). The performance of ZnO UV PDs can be improved in two orientations: by reduction of the dark current and by increasing the photocurrent. In the study, we used two processes to prepare ZnO UV PDs: photochemical vapor deposition to fabricate silicon dioxide as an insulator layer and a radio frequency sputter system to prepare the ZnO film as an active layer. The results show that the silicon dioxide layer can reduce the dark current. Moreover, a large photo−dark current ratio of the metal−insulator−semiconductor (MIS) structured PD is 200 times than the metal−semiconductor−metal (MSM) structured PD. When the silicon dioxide thickness is 98 nm, we can significantly enhance the rejection ratio. The silicon dioxide layer can reduce the noise effect and enhance the device detectivity. These results indicate that the insertion of a silicon dioxide layer into ZnO PDs is potentially useful for practical applications.

Original languageEnglish
Pages (from-to)27566-27571
Number of pages6
JournalACS Omega
Volume5
Issue number42
DOIs
Publication statusPublished - 2020 Oct 27

All Science Journal Classification (ASJC) codes

  • General Chemistry
  • General Chemical Engineering

Fingerprint

Dive into the research topics of 'Fabrication of silicon dioxide by photo-chemical vapor deposition to decrease detector current of ZnO ultraviolet photodetectors'. Together they form a unique fingerprint.

Cite this