Feasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithography

C. H. Lin, L. A. Wang

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

HMD SO-based PECVD films were studied for use as bottom antireflective coating (BARC) materials for 157 nm lithography. The O2/HMDSO gas flow rate ratios were varied to obtain HMDSO films with different compositions and their optical properties were characterized. The optical characteristics of various HMDSO BARC layers were simulated to obtain an optimized BARC structure. The swing effects in resist before and after adding a BARC in the form of either a single layer or bilayer were compared. Furthermore, the tolerance of thickness control was determined.

Original languageEnglish
Pages (from-to)2357-2361
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume19
Issue number6
DOIs
Publication statusPublished - 2001 Nov 1

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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