Ferroelectric properties of Pb(Zr0.52Ti0.48)O3 thin films prepared by metal-organic decomposition process

Cheng Hsiung Lin, Wen Dung Hsu, I. Nan Lin

Research output: Contribution to journalConference articlepeer-review

21 Citations (Scopus)

Abstract

The perovskite LaNiO3 (LNO) and Pb(Zr0.52Ti0.48)O3 (PZT) thin films were successfully prepared using metal-organic decomposition (MOD) process. Perovskite LNO phase can be obtained at temperature as low as 600°C (30 s) in rapid thermal annealing (RTA) process. However, additional furnace annealing (FA) at 650°C (60 min) is needed in order to lower the electrical resistivity of the LNO films to ρ ≤ 30 mΩ cm. Pure perovskite PZT films can easily be obtained by either RTA or FA process. Furnace post-annealing process (650°C, 60 min) results in a PZT film possessing significantly better ferroelectric properties than the RTA process (650°C, 60 s). The best properties obtained are remanent polarization Pr = 11.8 μC/cm2, coercive force Ec = 76.0 μC/cm2 and leakage current density JL ≤ 3 × 10-6 A/cm2 (for applied field ≤ 200 kV/cm). Using LNO films as buffer layer does not increase the ferroelectric properties of PZT films, but significantly improves fatigue behavior.

Original languageEnglish
Pages (from-to)418-421
Number of pages4
JournalApplied Surface Science
Volume142
Issue number1
DOIs
Publication statusPublished - 1999 Apr
EventProceedings of the 1998 9th International Conference on Solid Films and Surfaces, ICSFS-9 - Copenhagen, Denmark
Duration: 1998 Jul 61998 Jul 10

All Science Journal Classification (ASJC) codes

  • General Chemistry
  • Condensed Matter Physics
  • General Physics and Astronomy
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint

Dive into the research topics of 'Ferroelectric properties of Pb(Zr0.52Ti0.48)O3 thin films prepared by metal-organic decomposition process'. Together they form a unique fingerprint.

Cite this