Field-dependence of the area-density of ‘cold’ electron emission sites on broad-area CVD diamond films

N. S. Xu, R. V. Latham, Yon-Hua Tzeng

Research output: Contribution to journalArticlepeer-review

223 Citations (Scopus)

Abstract

A high area density of field-induced electron emission sites has been observed on broad-area (12 mm in diameter) CVD diamond films deposited on molybdenum substrates. Furthermore, it was found that the density increased with the electric field applied to the surface of the films. These findings indicate that the CVD diamond film has to be seen as a potentially favoured candidate among electronic materials for the development of new types of cold cathode electron source.

Original languageEnglish
Pages (from-to)1596-1597
Number of pages2
JournalElectronics Letters
Volume29
Issue number18
DOIs
Publication statusPublished - 1993 Jan 1

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

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