Field emission properties of tungsten films exhibiting a rod-like structure

Chin Tang Hsieh; Jyh Ming Ting

doi:10.1016/j.cplett.2005.07.050

Field emission properties of tungsten films exhibiting a rod-like structure

Chin Tang Hsieh, Jyh Ming Ting

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

A thermal evaporation method was used for the deposition of tungsten films. The tungsten source was resistively heated to a temperature between 1810 and 2010 °C for the deposition. The resulting BCC α-tungsten film exhibits a rod-like structure and a highly preferred (2 0 0) orientation. This unique microstructure leads to field emission properties that are not only superior to the other forms of tungsten but also better than most of the other thin film emitters. A low turn-on field of 1.3 V/μm and an extremely high field enhanced factor of 398095 were obtained.

Original language	English
Pages (from-to)	84-87
Number of pages	4
Journal	Chemical Physics Letters
Volume	413
Issue number	1-3
DOIs	https://doi.org/10.1016/j.cplett.2005.07.050
Publication status	Published - 2005 Sept 15

All Science Journal Classification (ASJC) codes

General Physics and Astronomy
Physical and Theoretical Chemistry

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10.1016/j.cplett.2005.07.050

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abstract = "A thermal evaporation method was used for the deposition of tungsten films. The tungsten source was resistively heated to a temperature between 1810 and 2010 °C for the deposition. The resulting BCC α-tungsten film exhibits a rod-like structure and a highly preferred (2 0 0) orientation. This unique microstructure leads to field emission properties that are not only superior to the other forms of tungsten but also better than most of the other thin film emitters. A low turn-on field of 1.3 V/μm and an extremely high field enhanced factor of 398095 were obtained.",

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AU - Ting, Jyh Ming

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AB - A thermal evaporation method was used for the deposition of tungsten films. The tungsten source was resistively heated to a temperature between 1810 and 2010 °C for the deposition. The resulting BCC α-tungsten film exhibits a rod-like structure and a highly preferred (2 0 0) orientation. This unique microstructure leads to field emission properties that are not only superior to the other forms of tungsten but also better than most of the other thin film emitters. A low turn-on field of 1.3 V/μm and an extremely high field enhanced factor of 398095 were obtained.

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Field emission properties of tungsten films exhibiting a rod-like structure

Abstract

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