Flicker Noise of AlGaNGaN Metal-Oxide-Semiconductor Heterostructure Field-Effect Transistor with a Photo-CVD Si O2 Layer

C. H. Liu, K. T. Lam, Shoou-Jinn Chang, C. K. Wang, Y. S. Sun

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

The effects of drain-source distance and applied voltage on low-frequency noise behavior of AlGaNGaN metal-oxide-semiconductor heterostructure field-effect-transistors incorporated with a photochemical vapor deposited (photo-CVD) Si O2 gate oxide layer were investigated. According to our studies, the normalized noise power density is inversely proportional to L′ (= Ld-s - Lgate) when devices are biased in the linear region. However, the drain-source distance alone exerts little influence on low-frequency noise in the saturation and cutoff regions. Furthermore, the 1 f noise characteristics and the value were affected by the interface state distribution in the energy bandgap as the gate bias was varied. The normalized noise power density determined is independent of the drain-source voltage in the linear region, but it exhibits an enhancement in the saturation region in response to an increase in the drain-source voltage. However, the noise power density then becomes constant when devices are biased in the cutoff region.

Original languageEnglish
JournalJournal of the Electrochemical Society
Volume154
Issue number2
DOIs
Publication statusPublished - 2007 Jan 19

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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