Formation mechanism and mechanics of dip-pen N ano lithography using molecular dynamics

Cheng Da Wu, Te Hua Fang, Jen-Fin Lin

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

Molecular dynamics simulations are used to investigate the mechanisms of molecular transference, pattern, formation, and mechanical behavior in the dip-pen nanolithography (DPN) process. The effects of deposition temperature were studied using molecular trajectories, the meniscus characteristic, surface absorbed energy, and pattern formation analysis. At the first transferred stage (at the initial indentation depth), the conformation of SAM. molecules lies almost on the substrate surface. The molecules start to stand, on the substrate due to the pull and drag forces at the second transferred stage (after the tip is pulled up). According to the absorbed energy behavior, the second transferred stage has larger transferred amounts and the transfer rate is strongly related to temperature. When molecules were deposited at low temperature (e.g., room temperature), the pattern shape was more highly concentrated. The pattern shape at high temperatures expanded and the area increased because of good molecular diffusion.

Original languageEnglish
Pages (from-to)3237-3241
Number of pages5
JournalLangmuir
Volume26
Issue number5
DOIs
Publication statusPublished - 2010 Mar 2

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

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