Formation of epitaxial silicide in silicon nanowires

Yi Chia Chou, Kuo-Chang Lu, King Ning Tu

Research output: Chapter in Book/Report/Conference proceeding › Chapter

Original language	English
Title of host publication	Silicon and Silicide Nanowires
Subtitle of host publication	Applications, Fabrication and Properties
Publisher	Pan Stanford Publishing Pte. Ltd.
Pages	187-243
Number of pages	57
ISBN (Electronic)	9789814303477
ISBN (Print)	9789814303460
DOIs	https://doi.org/10.4032/9789814303477
Publication status	Published - 2013 Sept 30

All Science Journal Classification (ASJC) codes

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title = "Formation of epitaxial silicide in silicon nanowires",

author = "Chou, {Yi Chia} and Kuo-Chang Lu and Tu, {King Ning}",

year = "2013",

month = sep,

day = "30",

doi = "10.4032/9789814303477",

language = "English",

isbn = "9789814303460",

pages = "187--243",

booktitle = "Silicon and Silicide Nanowires",

publisher = "Pan Stanford Publishing Pte. Ltd.",

}

TY - CHAP

T1 - Formation of epitaxial silicide in silicon nanowires

AU - Chou, Yi Chia

AU - Lu, Kuo-Chang

AU - Tu, King Ning

PY - 2013/9/30

Y1 - 2013/9/30

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M3 - Chapter

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SN - 9789814303460

SP - 187

EP - 243

BT - Silicon and Silicide Nanowires

PB - Pan Stanford Publishing Pte. Ltd.

ER -