Formation of Methyl Radicals during the Oxidative Addition of Iodomethane to a Single-Crystal Copper Surface

Jong-Liang Lin, Brian E. Bent

Research output: Contribution to journalArticle

54 Citations (Scopus)

Abstract

Submonolayer quantities of CH3I have been adsorbed onto an atomically-clean Cu(111) single-crystal surface under ultra-high-vacuum conditions. At 110 K, the molecules remain intact. Upon heating the surface, the carbon-iodine bond dissociates at 140 K to produce adsorbed methyl groups (which have been identified by surface vibrational spectroscopy) and gas-phase methyl radicals (which are detected by mass spectrometry). The activation energy for these processes is ∼8.5 kcal/mol. The observation of methyl radicals suggests that the surface reaction is analogous to the oxidative addition of alkyl iodides to metal compounds by atom-transfer or electron-transfer mechanisms. The thermodynamics and kinetics of both mechanisms are discussed in the context of the Cu(111) results.

Original languageEnglish
Pages (from-to)2849-2853
Number of pages5
JournalJournal of the American Chemical Society
Volume115
Issue number7
DOIs
Publication statusPublished - 1993 Apr 1

All Science Journal Classification (ASJC) codes

  • Catalysis
  • Chemistry(all)
  • Biochemistry
  • Colloid and Surface Chemistry

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