In this paper, a novel procedure to fabricate potassium tantalate thin films (KT), named soft solution processing, has been proposed. KT films have been successfully prepared in concentrated KOH solutions at temperatures below 150 °C by electrochemical or hydrothermal-electrochemical method. X-Ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and atomic force microscope (AFM) techniques have been used to characterize the structure and morphology of films. Films show pyrochlore structures without contamination. Crystalline KT grain could be still observed for the films prepared at a temperature as low as 50 °C in 5.0 M KOH solution with the galvanostatic treatment at the current density of 10.0 mA cm-2. A dissolution-crystallization mechanism has been used to explain the observed experimental phenomena.
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry