Abstract
An new photo-spacer and bump formation in one-shot process has been developed by using a gray-tone mask. In this design, two to three kind of photo-resist height can be formed in one photolithography step. Bump with sapcer, concave shaped bump, or anti-bump can then be formed with different mask pattern design. Moreover, this new process can be readily applied to top ITO type LCD, such as LTPs TFT-LCD. The effect of the mask pattern can be simulated first to check the exposure result. The optimized results are also reported.
| Original language | English |
|---|---|
| Pages (from-to) | 569-572 |
| Number of pages | 4 |
| Journal | SID Conference Record of the International Display Research Conference |
| Publication status | Published - 2001 |
| Event | Asia Display/IDW 2001 - Nagoya, Japan Duration: 2002 Oct 16 → 2002 Oct 19 |
All Science Journal Classification (ASJC) codes
- Electrical and Electronic Engineering