Free-standing single-crystalline chemically vapor deposited diamond films

Y. Tzeng, J. Wei, J. T. Woo, W. Lanford

Research output: Contribution to journalArticle

31 Citations (Scopus)

Abstract

Free-standing chemically vapor deposited (CVD) single-crystalline diamond films have been fabricated by a sequence of processes including high energy ion implantation, microwave plasma enhanced chemical vapor deposition, and the final separation of the diamond epilayer from the substrate by heating in oxygen. The homoepitaxial diamond film separated from the substrate is about 15 μm thick. It is flat and transparent, and exhibits a sharp diamond Raman peak without nondiamond background signals. This process is promising for mass production of large-area single-crystalline diamonds with the size restricted only by the availability of one large initial diamond substrate. The initial substrate is expensive but can be used repetitively to produce a large number of single-crystalline CVD diamond films.

Original languageEnglish
Pages (from-to)2216-2218
Number of pages3
JournalApplied Physics Letters
Volume63
Issue number16
DOIs
Publication statusPublished - 1993 Dec 1

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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