GaN-based LEDs with double strain releasing MQWs and Si delta-doping layers

Chung Ying Chang, Shoou Jinn Chang, C. H. Liu, Shuguang Li, T. K. Lin

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)


In this letter, we report the fabrication of GaN-based light-emitting diodes (LEDs) with double strain releasing multiquantum wells and Si delta-doping (Si-DD) layers. We find that Si-DD can enhance current spreading in the in-plane direction and also suppress dislocation in the epitaxial layers. By inserting the Si-DD layers, we find that we can achieve a smaller forward voltage. We also find that we can significantly increase the reverse breakdown voltage from 35 to 125 V by introducing Si-DD layers. Furthermore, we find that the output power of the LED with Si-DD is more than 10% larger than that of the LED without Si-DD.

Original languageEnglish
Article number6294429
Pages (from-to)1809-1811
Number of pages3
JournalIEEE Photonics Technology Letters
Issue number20
Publication statusPublished - 2012

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering


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