GaN-based LEDs with GaN μ-pillars around mesa, patterned substrate, and reflector under pads

Li Chi Peng, Wei Chin Lai, Ming Nan Chang, Shih Chang Shei, Jinn Kong Sheu

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

Nitride-based light-emitting diodes (LEDs) with textured sidewall, GaN μ-pillars around mesa region, patterned sapphire substrate (PSS), and highly reflective Ag-Cr-Au electrode pads were fabricated using the conventional lithography method (labeled as experimental LEDs). When a 20-mA injection current was applied, forward voltages were 3.18 and 3.4 V for the conventional and experimental LEDs, respectively. The high 20-mA Vf of LEDs with Ag-Cr-Au electrode pads could be attributed to the fact that the specific contact resistance of n+-GaN-Ag-Cr-Au is slightly higher than that of the n+-GaN-Cr-Au contact. It was found that we could achieve much stronger LED output power with textured sidewalls, GaN μ-pillars around mesa region, PSS, and highly reflective Ag-Cr-Au electrode pads. It was also found that we could enhance LED output power by more than 80% compared with the conventional LEDs.

Original languageEnglish
Pages (from-to)1659-1661
Number of pages3
JournalIEEE Photonics Technology Letters
Volume21
Issue number22
DOIs
Publication statusPublished - 2009 Nov 15

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

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