GaN diffractive microlenses fabricated with gray-level mask

Chii Chang Chen; Ming Hung Li; Chih Yang Chang; Jinn Kong Sheu; Gou Chung Chi; Wei Tai Cheng; Jui Hung Yeh; Jenq Yang Chang; Toshiaki Ito

doi:10.1016/S0030-4018(02)02198-3

GaN diffractive microlenses fabricated with gray-level mask

Chii Chang Chen, Ming Hung Li, Chih Yang Chang, Jinn Kong Sheu, Gou Chung Chi, Wei Tai Cheng, Jui Hung Yeh, Jenq Yang Chang, Toshiaki Ito

Department of Photonics

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

Plano-convex diffractive microlenses were fabricated in GaN-based materials with a gray-level mask for the first time. The surface relief of the gray-level diffractive microlens on photoresist was transferred onto GaN by inductively coupled plasma etching technique. The microlenses were characterized with a blue laser diode emitting at 405 nm. The focal length of the GaN diffractive microlens is 14.5 cm. The GaN microlenses can be used for the applications of the micro-optics systems in blue-violet-UV regions such as high-density optical data storage. The potential of the realization of the high-numerical-aperture diffractive microlens in GaN with gray-level mask is discussed.

Original language	English
Pages (from-to)	75-78
Number of pages	4
Journal	Optics Communications
Volume	215
Issue number	1-3
DOIs	https://doi.org/10.1016/S0030-4018(02)02198-3
Publication status	Published - 2002 Jan 1

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Physical and Theoretical Chemistry
Electrical and Electronic Engineering

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10.1016/S0030-4018(02)02198-3

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@article{663ac01bd3bc4fbfa8f5a484d411a551,

title = "GaN diffractive microlenses fabricated with gray-level mask",

abstract = "Plano-convex diffractive microlenses were fabricated in GaN-based materials with a gray-level mask for the first time. The surface relief of the gray-level diffractive microlens on photoresist was transferred onto GaN by inductively coupled plasma etching technique. The microlenses were characterized with a blue laser diode emitting at 405 nm. The focal length of the GaN diffractive microlens is 14.5 cm. The GaN microlenses can be used for the applications of the micro-optics systems in blue-violet-UV regions such as high-density optical data storage. The potential of the realization of the high-numerical-aperture diffractive microlens in GaN with gray-level mask is discussed.",

author = "Chen, {Chii Chang} and Li, {Ming Hung} and Chang, {Chih Yang} and Sheu, {Jinn Kong} and Chi, {Gou Chung} and Cheng, {Wei Tai} and Yeh, {Jui Hung} and Chang, {Jenq Yang} and Toshiaki Ito",

note = "Funding Information: The work was supported by grants, NSC-91-2112-M-008-034, from National Science Council, Taiwan, and from MOE Program for Promoting Academic Excellence of Universities under the Grant No. 91-E-FA06-1-4. ",

year = "2002",

month = jan,

day = "1",

doi = "10.1016/S0030-4018(02)02198-3",

language = "English",

volume = "215",

pages = "75--78",

journal = "Optics Communications",

issn = "0030-4018",

publisher = "Elsevier",

number = "1-3",

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TY - JOUR

T1 - GaN diffractive microlenses fabricated with gray-level mask

AU - Chen, Chii Chang

AU - Li, Ming Hung

AU - Chang, Chih Yang

AU - Sheu, Jinn Kong

AU - Chi, Gou Chung

AU - Cheng, Wei Tai

AU - Yeh, Jui Hung

AU - Chang, Jenq Yang

AU - Ito, Toshiaki

N1 - Funding Information: The work was supported by grants, NSC-91-2112-M-008-034, from National Science Council, Taiwan, and from MOE Program for Promoting Academic Excellence of Universities under the Grant No. 91-E-FA06-1-4.

PY - 2002/1/1

Y1 - 2002/1/1

N2 - Plano-convex diffractive microlenses were fabricated in GaN-based materials with a gray-level mask for the first time. The surface relief of the gray-level diffractive microlens on photoresist was transferred onto GaN by inductively coupled plasma etching technique. The microlenses were characterized with a blue laser diode emitting at 405 nm. The focal length of the GaN diffractive microlens is 14.5 cm. The GaN microlenses can be used for the applications of the micro-optics systems in blue-violet-UV regions such as high-density optical data storage. The potential of the realization of the high-numerical-aperture diffractive microlens in GaN with gray-level mask is discussed.

AB - Plano-convex diffractive microlenses were fabricated in GaN-based materials with a gray-level mask for the first time. The surface relief of the gray-level diffractive microlens on photoresist was transferred onto GaN by inductively coupled plasma etching technique. The microlenses were characterized with a blue laser diode emitting at 405 nm. The focal length of the GaN diffractive microlens is 14.5 cm. The GaN microlenses can be used for the applications of the micro-optics systems in blue-violet-UV regions such as high-density optical data storage. The potential of the realization of the high-numerical-aperture diffractive microlens in GaN with gray-level mask is discussed.

UR - http://www.scopus.com/inward/record.url?scp=0036460815&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0036460815&partnerID=8YFLogxK

U2 - 10.1016/S0030-4018(02)02198-3

DO - 10.1016/S0030-4018(02)02198-3

M3 - Article

AN - SCOPUS:0036460815

SN - 0030-4018

VL - 215

SP - 75

EP - 78

JO - Optics Communications

JF - Optics Communications

IS - 1-3

ER -

GaN diffractive microlenses fabricated with gray-level mask

Abstract

All Science Journal Classification (ASJC) codes

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