Abstract
We propose a way to enhance the performance of the GaN-based UV metal-semiconductor-metal (MSM) photodetectors by jointly incorporating a semi-insulating AlInN cap layer with a sputtered indium tin oxide (ITO) electrode. The results show that a dark current as low as 1.49× 10-8 A/ cm2 can be achieved via the insertion of highly resistive AlInN cap layers. A UV-to-visible rejection ratio as high as 28,306 with a 5 V applied bias can also be realized with this design. Furthermore, a much reduced noise-equivalent power of 2.85× 10-14 W and a rather high normalized detectivity of 2.15× 1013 cm Hz0.5 W-1 are also realized when the ITO electrode is used.
Original language | English |
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Pages (from-to) | H369-H372 |
Journal | Electrochemical and Solid-State Letters |
Volume | 12 |
Issue number | 10 |
DOIs | |
Publication status | Published - 2009 |
All Science Journal Classification (ASJC) codes
- General Chemical Engineering
- General Materials Science
- Physical and Theoretical Chemistry
- Electrochemistry
- Electrical and Electronic Engineering