Abstract
GaN Schottky barrier UV photodetectors (PDs) with a β-Ga 2O3 cap layer realized by furnace oxidation of GaN epitaxial layer were fabricated and characterized. With the cap layer inserted, it was found that the reverse leakage current could be reduced by more than 4 orders of magnitude and the UV-to-visible rejection ratio increased by 21 times. When compared with the conventional GaN PDs, incorporating an additional β-Ga2O3 cap layer helps to reduce the noise level and at the same time achieve a larger detectivity.
Original language | English |
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Article number | 116701 |
Journal | Applied Physics Express |
Volume | 5 |
Issue number | 11 |
DOIs | |
Publication status | Published - 2012 Nov |
All Science Journal Classification (ASJC) codes
- General Engineering
- General Physics and Astronomy