Graded silicon nanostructure arrays for tailoring antireflection performances

Cheng Chuan Wang, Chia Yun Chen, Ya Ching Chou

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Advances in nanofabrication have resulted in great potentials for improving in both device performance and the manufacturing process of various applications. One revolutionary example is silicon (Si) nanostructures, typically using Si nanopore arrays or Si nanowire arrays, to construct high efficient and low-cost solar cells. In this work, we develop the innovative combined nanostructure arrays with tailored structural profiles using inexpensive, simple and rapid etching processes, whose total reflection is suppressed to 1.6%, approximately 39% less than Si nanopore arrays, and 20% less than Si nanowire arrays. In addition, systematic investigations on wettability of textured Si surfaces reveal the inherent surface oxidation during etching process. These combined nanostructure arrays with tailored antireflection performances, along with the in-depth studies of underlying etching mechanisms, may benefit both the yield and cost efficiently in industrial standard of silicon solar cells.

Original languageEnglish
Title of host publicationApplied Science and Precision Engineering Innovation
Pages105-109
Number of pages5
DOIs
Publication statusPublished - 2014
EventInternational Applied Science and Precision Engineering Conference 2013, ASPEC 2013 - NanTou, Taiwan
Duration: 2013 Oct 182013 Oct 22

Publication series

NameApplied Mechanics and Materials
Volume479-480
ISSN (Print)1660-9336
ISSN (Electronic)1662-7482

Other

OtherInternational Applied Science and Precision Engineering Conference 2013, ASPEC 2013
CountryTaiwan
CityNanTou
Period13-10-1813-10-22

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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