Growth and characteristics of TiNiCu thin films

Po Yen Hsu, Jyh Ming Ting

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

Deposition of TiNiCu-based thin films was performed using a DC sputter deposition technique. The target composition was varied such that a series of TiNiCu thin films with various compositions were obtained. It is found that the deposition rate decreases with both Ti and Ni concentrations, while increases with Cu concentration. The activation energy for crystallization was determined. The activation energy ranges from 340.4 to 702.3 kJ/mol. It increases and then decreases with Ti or Ni concentration and the peak value occurs at a composition of Ti45.7Ni41.1Cu13.2. Surface chemistry of TiNiCu-based thin films was analyzed to examine the effects of the film composition and the exposure time to the ambient condition. The result indicates a preferential formation of TiO2, which suppresses the surface concentrations of both Ni and Cu. The addition of Cu leads to the formation of copper oxide which could be reduced by the formation of TiO2, should the time permit.

Original languageEnglish
Pages (from-to)524-529
Number of pages6
JournalThin Solid Films
Volume420-421
DOIs
Publication statusPublished - 2002 Dec 2

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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