Growth and characterizations of ZnO nanorod/film structures on copper coated Si substrates

Wan Yu Wu, Ming Ta Chen, Jyh Ming Ting

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

ZnO deposits were obtained on electroless copper coated Si substrates using a conventional RF magnetron sputter deposition technique at room temperature. The deposition pressure was varied from 6.67 Pa to 0.667 Pa. The RF powers were from 100 to 200 W and the electrode distance was fixed at 5 cm. The ZnO deposition time was varied from 1 to 30 min. The deposits consist of ZnO nanorods and a ZnO film, with the roots of the nanorods embedded in the film. The growth of the nanorods far exceeds the growth of the film in the beginning of the deposition process. The nanorod lengthening rate then slows down and becomes lower than the film growth rate. Effects of sputter deposition parameters on the growth of ZnO nanorods/film structures were also investigated.

Original languageEnglish
Pages (from-to)1549-1552
Number of pages4
JournalThin Solid Films
Volume518
Issue number5
DOIs
Publication statusPublished - 2009 Dec 31

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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