Engineering & Materials Science
Chemical vapor deposition
84%
Crystal growth from melt
41%
Diffraction patterns
34%
Epilayers
41%
Epitaxial films
36%
Experiments
8%
Gallium nitride
100%
Growth temperature
38%
Optical properties
30%
Photoluminescence
39%
Single crystals
55%
Substrates
51%
Surface roughness
20%
Transmission electron microscopy
24%
X ray diffraction
23%
Chemical Compounds
Chemical Vapour Deposition
65%
Czochralski Process
36%
Emission Peak
25%
Epitaxial Film
34%
Liquid Film
11%
Nitride
70%
Optical Property
17%
Photoluminescence Spectrum
24%
Single Crystalline Solid
34%
Time
8%
Transmission Electron Microscopy
15%
X-Ray Diffraction
11%
Physics & Astronomy
characterization
13%
Czochralski method
29%
diffraction patterns
20%
gallium nitrides
84%
optical properties
15%
photoluminescence
16%
roughness
19%
single crystals
30%
temperature
7%
transmission electron microscopy
15%
vapor deposition
55%
x rays
10%