Growth behaviour of polyaniline films deposited by pulse potentiostatic method

V. Rajendran, A. Gopalan, T. Vasudevan, Wei Chih Chen, Ten Chin Wen

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

Electrochemical polymerization of aniline (ANI) was performed in aqueous 0.5 M H2SO4 using pulse potentiostatic method (PPSM). The polymeric films were deposited under different tuneable pulse parameters in PPSM like pulse number (Pn), pulse width (Pw) and variations of aniline concentrations. Cyclic voltammetry was used for evaluating the characteristics of the deposited polymeric films. A suitable equation relating the growth of the deposited films and the pulse parameters in PPSM was deduced as: growth = k[ANI]PnPw where k is growth rate constant and k value was evaluated through growth function. Various surface parameters were evaluated. The surface excess and thickness of the film showed increasing trend with increasing [ANI] and Pn. The polymer was also characterized in various acidity conditions. The elcectroactivity of the film was found to be retained in highly acidic solution and showed decreasing activity with increasing pH.

Original languageEnglish
Pages (from-to)320-328
Number of pages9
JournalMaterials Chemistry and Physics
Volume65
Issue number3
DOIs
Publication statusPublished - 2000 Aug 15

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics

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