Abstract
Aluminum nitride epitaxial films of thicknesses greater than 10 μ with excellent mechanical and chemical stability have been grown on R-plane sapphire substrates. The orientation relationship of single-crystal AlN on sapphire is discussed. Examination of the as-grown AlN film surface with a scanning electron microscope identifies the growth morphology and enables differentiation between good and poor quality films. The surface-acoustic-wave coupling constant K 2 and propagation velocity Vs are measured out to a thickness-to-wavelength ratio t/λ=0.75 with typical K2 values of 0.8% and Vs of 6.1 km/sec. Preliminary results also indicate that AlN-sapphire interfacial strain extends about 1 μ into the AlN film.
Original language | English |
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Pages (from-to) | 3703-3706 |
Number of pages | 4 |
Journal | Journal of Applied Physics |
Volume | 46 |
Issue number | 9 |
DOIs | |
Publication status | Published - 1975 |
All Science Journal Classification (ASJC) codes
- General Physics and Astronomy