Growth of CNTs on hydrogen plasma etched Fe-Si thin films

Jyh-Ming Ting, Shih Wei Hung

Research output: Contribution to journalLetter

5 Citations (Scopus)
Original languageEnglish
Pages (from-to)1119-1121
Number of pages3
JournalCarbon
Volume45
Issue number5
DOIs
Publication statusPublished - 2007 Apr 1

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Plasmas
Thin films
Hydrogen

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)

Cite this

Ting, Jyh-Ming ; Hung, Shih Wei. / Growth of CNTs on hydrogen plasma etched Fe-Si thin films. In: Carbon. 2007 ; Vol. 45, No. 5. pp. 1119-1121.
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Growth of CNTs on hydrogen plasma etched Fe-Si thin films. / Ting, Jyh-Ming; Hung, Shih Wei.

In: Carbon, Vol. 45, No. 5, 01.04.2007, p. 1119-1121.

Research output: Contribution to journalLetter

TY - JOUR

T1 - Growth of CNTs on hydrogen plasma etched Fe-Si thin films

AU - Ting, Jyh-Ming

AU - Hung, Shih Wei

PY - 2007/4/1

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DO - 10.1016/j.carbon.2007.01.016

M3 - Letter

AN - SCOPUS:34047112982

VL - 45

SP - 1119

EP - 1121

JO - Carbon

JF - Carbon

SN - 0008-6223

IS - 5

ER -