Growth of CNTs on hydrogen plasma etched Fe-Si thin films

Jyh Ming Ting; Shih Wei Hung

doi:10.1016/j.carbon.2007.01.016

Growth of CNTs on hydrogen plasma etched Fe-Si thin films

Research output: Contribution to journal › Letter › peer-review

Original language	English
Pages (from-to)	1119-1121
Number of pages	3
Journal	Carbon
Volume	45
Issue number	5
DOIs	https://doi.org/10.1016/j.carbon.2007.01.016
Publication status	Published - 2007 Apr

All Science Journal Classification (ASJC) codes

Chemistry(all)
Materials Science(all)

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10.1016/j.carbon.2007.01.016

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@article{5431298a99d64e13a38f979154c06fa6,

title = "Growth of CNTs on hydrogen plasma etched Fe-Si thin films",

author = "Ting, {Jyh Ming} and Hung, {Shih Wei}",

note = "Funding Information: This work was supported by the National Science Council in Taiwan under Grant Nos. NSC 94-2216-E-006-035 and NSC 94-2622-E-006-036. Copyright: Copyright 2007 Elsevier B.V., All rights reserved.",

year = "2007",

month = apr,

doi = "10.1016/j.carbon.2007.01.016",

language = "English",

volume = "45",

pages = "1119--1121",

journal = "Carbon",

issn = "0008-6223",

publisher = "Elsevier Limited",

number = "5",

}

TY - JOUR

T1 - Growth of CNTs on hydrogen plasma etched Fe-Si thin films

AU - Ting, Jyh Ming

AU - Hung, Shih Wei

N1 - Funding Information: This work was supported by the National Science Council in Taiwan under Grant Nos. NSC 94-2216-E-006-035 and NSC 94-2622-E-006-036. Copyright: Copyright 2007 Elsevier B.V., All rights reserved.

PY - 2007/4

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U2 - 10.1016/j.carbon.2007.01.016

DO - 10.1016/j.carbon.2007.01.016

M3 - Letter

AN - SCOPUS:34047112982

SN - 0008-6223

VL - 45

SP - 1119

EP - 1121

JO - Carbon

JF - Carbon

IS - 5

ER -

Growth of CNTs on hydrogen plasma etched Fe-Si thin films

All Science Journal Classification (ASJC) codes

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