Growth of large-area non-polar ZnO film without constraint to substrate using oblique-angle sputtering deposition

Non-polar ZnO thin film with high crystal quality is grown on a glass substrate using one-step oblique-angle deposition. Cross-sectional transmission electron microscopy images and selected area electron diffraction patterns reveal that the film is constructed as a stack of grains from the bottom to the top with the [0. 0. 0. 2] axis gradually titled from a vertical to a nearly horizontal orientation with respect to the substrate. The (0. 0. 0. 2) pole figure exhibits a continuous angle distribution in the ψ direction with the most concentration at approximately ψ=18° and φ= 0°. Strong anisotropic effects in local electronic structure were observed for the highly oriented ZnO surface rod by angle-dependent X-ray absorption near-edge structure measurements. The structure also exhibits polarization that depends on Raman scattering.