Hardware implementations and performance assessments of a DC magnetron sputter for enhanced depositions

Cheng Tsung Liu, Chih Wen Chang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

To refine the substrate deposition results, some supplementary mechanical adjustments can be designed and implemented onto the existing DC magnetron sputters (MS). By the assistances of these attachments along with proper controls on the magnetic and electric field paths inside the vacuum chamber, results indicated that more target atoms can be sputtered and smoother depositions on the substrate surface can be achieved. Based on appropriate performance index selections, operations of the DC MS were thoroughly investigated. Selected regions on the deposited substrate surface will be probed with thickness gauge and atomic force microscopy, thus the operational performances of the DC MS with structural refinements can be assessed and the desired improvements can then be systematically validated.

Original languageEnglish
Title of host publicationProceedings of the 2013 IEEE International Electric Machines and Drives Conference, IEMDC 2013
Pages1477-1481
Number of pages5
DOIs
Publication statusPublished - 2013
Event2013 IEEE International Electric Machines and Drives Conference, IEMDC 2013 - Chicago, IL, United States
Duration: 2013 May 122013 May 15

Publication series

NameProceedings of the 2013 IEEE International Electric Machines and Drives Conference, IEMDC 2013

Other

Other2013 IEEE International Electric Machines and Drives Conference, IEMDC 2013
Country/TerritoryUnited States
CityChicago, IL
Period13-05-1213-05-15

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

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