TY - JOUR
T1 - High characteristic temperature Be-doped In0.5Ga0.5As quantum dot lasers grown on GaAs substrates by molecular beam epitaxy
AU - Nee, Tzer En
AU - Yeh, Nien Tze
AU - Lee, Jia Ming
AU - Chyi, Jen Inn
AU - Lee, Ching Ting
N1 - Funding Information:
The authors thank Dr. J.-L. Shieh, Dr. J.-W. Pan, and Mr. P.-W. Shiao for their assistance and fruitful discussion in epitaxial growth and device characterization. The support of the MBE laboratory of the Center for Optical Science at National Central University is gratefully acknowledged. This work was supported by the National Science Council of ROC under contract NSC87-2215-E008-012.
PY - 1999/5
Y1 - 1999/5
N2 - Be-doped In0.5Ga0.5As quantum dot lasers are fabricated and characterized between 20 and 70 °C. At 20 °C, the threshold current per dot layer and the slope efficiency are 22 mA and 0.18 W/A, respectively. The internal quantum efficiency and internal loss are 36% and 4.2 cm-1, respectively. Characteristic temperature as high as 122 K has been measured for these lasers. Room temperature continuous-wave operation has also been achieved.
AB - Be-doped In0.5Ga0.5As quantum dot lasers are fabricated and characterized between 20 and 70 °C. At 20 °C, the threshold current per dot layer and the slope efficiency are 22 mA and 0.18 W/A, respectively. The internal quantum efficiency and internal loss are 36% and 4.2 cm-1, respectively. Characteristic temperature as high as 122 K has been measured for these lasers. Room temperature continuous-wave operation has also been achieved.
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U2 - 10.1016/S0022-0248(99)00006-8
DO - 10.1016/S0022-0248(99)00006-8
M3 - Conference article
AN - SCOPUS:0032680614
SN - 0022-0248
VL - 201
SP - 905
EP - 908
JO - Journal of Crystal Growth
JF - Journal of Crystal Growth
T2 - Proceedings of the 1998 10th International Conference on Molecular Beam Epitaxy (MBE-X)
Y2 - 31 August 1998 through 4 September 1998
ER -