High contrast long-period waveguide gratings on silicon-on-insulator (SOI) substrates

Ricky W. Chuang, Guo Shian Wang, Mao Teng Hsu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We report the practicality of fabricating the long-period waveguide gratings (LPWGs) on silicon-on-insulator (SOI) substrates with amorphous silicon (a-Si) layer incorporated as a cladding layer. Specifically, the devices are etched and patterned on SOI wafer via an anisotropic wet etching technique, while the a-Si is deposited using plasma-enhanced chemical vapor deposition (PECVD) system. The experimental results later confirm that the LPWG devices resonate within a wavelength range between 1563 and 1580nm and the LPWG waveguide with a width of 8μm has delivered a dip contrast as high as 30 dB and the FWHM as narrow as 1.76nm, as the input light is polarized as transverse electric (TE) wave. With the transverse magnetic (TM) polarized wave provided as an input, the LPWG waveguide with the width of 10μm yields a dip contrast as high as 14.5 dB and its FWHM measured is as narrow as 1.32nm.

Original languageEnglish
Title of host publication2012 Photonics Global Conference, PGC 2012
DOIs
Publication statusPublished - 2012 Dec 1
Event2012 Photonics Global Conference, PGC 2012 - Singapore, Singapore
Duration: 2012 Dec 132012 Dec 16

Publication series

Name2012 Photonics Global Conference, PGC 2012

Other

Other2012 Photonics Global Conference, PGC 2012
CountrySingapore
CitySingapore
Period12-12-1312-12-16

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

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