Abstract
This paper reports the application of a newly developed lithography method, the Contact Transfer and Mask-Embedded Lithography (CMEL), in fabricating high-frequency (∼2 GHz) surface acoustic wave (SAW) filters. In sort, CMEL utilizes a thin metal film deposited on an anti-adhesion layer and a silicon mold with pre-fabricated features. The metal film bearing the mold's surface pattern can be transferred into a photo-resist layer deposited on a substrate. Subsequent etchings complete the lithography and the micro/nano-fabrication. To demonstrate CMEL and its potential, we apply CMEL for fabricating interdigital transducers of SAW filters with a line width down to 500 nm. Using a LiNbO 3 substrate, the operating frequency can reach 1.8 to 2 GHz based on this simple and easy-to-implement lithography method. Details in the CMEL, the lithography results, the high-frequency performance of the fabricated SAW devices, as well as future developments of this simple lithography method will be addressed.
| Original language | English |
|---|---|
| Title of host publication | 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008 |
| Pages | 402-405 |
| Number of pages | 4 |
| DOIs | |
| Publication status | Published - 2008 Sep 1 |
| Event | 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008 - Sanya, China Duration: 2008 Jan 6 → 2008 Jan 9 |
Publication series
| Name | 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS |
|---|
Other
| Other | 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008 |
|---|---|
| Country | China |
| City | Sanya |
| Period | 08-01-06 → 08-01-09 |
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All Science Journal Classification (ASJC) codes
- Control and Systems Engineering
- Electrical and Electronic Engineering
Cite this
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High-frequency surface acoustic wave (SAW) devices fabricated by Contact-Transferred and Mask-Embedded lithography. / Liu, Chin Hsin; Chiu, Cheng Yu; Lee, Yung-Chun; Chang, Shuo Hung.
3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008. 2008. p. 402-405 4484359 (3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
TY - GEN
T1 - High-frequency surface acoustic wave (SAW) devices fabricated by Contact-Transferred and Mask-Embedded lithography
AU - Liu, Chin Hsin
AU - Chiu, Cheng Yu
AU - Lee, Yung-Chun
AU - Chang, Shuo Hung
PY - 2008/9/1
Y1 - 2008/9/1
N2 - This paper reports the application of a newly developed lithography method, the Contact Transfer and Mask-Embedded Lithography (CMEL), in fabricating high-frequency (∼2 GHz) surface acoustic wave (SAW) filters. In sort, CMEL utilizes a thin metal film deposited on an anti-adhesion layer and a silicon mold with pre-fabricated features. The metal film bearing the mold's surface pattern can be transferred into a photo-resist layer deposited on a substrate. Subsequent etchings complete the lithography and the micro/nano-fabrication. To demonstrate CMEL and its potential, we apply CMEL for fabricating interdigital transducers of SAW filters with a line width down to 500 nm. Using a LiNbO 3 substrate, the operating frequency can reach 1.8 to 2 GHz based on this simple and easy-to-implement lithography method. Details in the CMEL, the lithography results, the high-frequency performance of the fabricated SAW devices, as well as future developments of this simple lithography method will be addressed.
AB - This paper reports the application of a newly developed lithography method, the Contact Transfer and Mask-Embedded Lithography (CMEL), in fabricating high-frequency (∼2 GHz) surface acoustic wave (SAW) filters. In sort, CMEL utilizes a thin metal film deposited on an anti-adhesion layer and a silicon mold with pre-fabricated features. The metal film bearing the mold's surface pattern can be transferred into a photo-resist layer deposited on a substrate. Subsequent etchings complete the lithography and the micro/nano-fabrication. To demonstrate CMEL and its potential, we apply CMEL for fabricating interdigital transducers of SAW filters with a line width down to 500 nm. Using a LiNbO 3 substrate, the operating frequency can reach 1.8 to 2 GHz based on this simple and easy-to-implement lithography method. Details in the CMEL, the lithography results, the high-frequency performance of the fabricated SAW devices, as well as future developments of this simple lithography method will be addressed.
UR - http://www.scopus.com/inward/record.url?scp=50249115191&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=50249115191&partnerID=8YFLogxK
U2 - 10.1109/NEMS.2008.4484359
DO - 10.1109/NEMS.2008.4484359
M3 - Conference contribution
SN - 9781424419081
T3 - 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS
SP - 402
EP - 405
BT - 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008
ER -