High performance GaN-based hydrogen sensors

W. C. Hsu, J. R. Huang, K. W. Lin, H. I. Chen, W. C. Liu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The hydrogen sensing characteristics of the catalytic Pd/GaN and Pd/InGaP MS diodes are systematically studied and compared over wide hydrogen concentration and temperature regimes. Experimentally, upon exposing to hydrogen-containing gases, both forward- and reverse-biased currents of both studied devices are substantially increased with increasing the hydrogen concentration. In other words, both studied devices can be operated under applied bipolarly voltages. Furthermore, particularly under very wide hydrogen concentration regimes, the studied Pd/GaN MS diode can withstand higher temperature operation with remarkable forward and reverse sensitivities of hydrogen detection. In addition, due to larger Schottky barrier height lowering effect, the hydrogen adsorption performance for the Pd/GaN MS diode manifests the superior sensitivity of Schottky barrier variation, especially at higher temperature operation. In contrast, the studied Pd/InGaP MS diode offers remarkable shorter response time of hydrogen adsorption process than the Pd/GaN one particularly at lower temperature operation and is suitable for the lower hydrogen concentration detection.

Original languageEnglish
Title of host publicationECS Transactions - 46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface
PublisherElectrochemical Society Inc.
Pages163-182
Number of pages20
Edition2
ISBN (Electronic)9781566775519
ISBN (Print)9781566775519
DOIs
Publication statusPublished - 2007
Event46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface - 211th ECS Meeting - Chicago, IL, United States
Duration: 2007 May 62007 May 10

Publication series

NameECS Transactions
Number2
Volume6
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

Other46th State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XLVI) and the 2nd International Symposium on Processes at the Semiconductor-Solution Interface - 211th ECS Meeting
Country/TerritoryUnited States
CityChicago, IL
Period07-05-0607-05-10

All Science Journal Classification (ASJC) codes

  • General Engineering

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