High-Quality AlN Films Grown on Chemical Vapor-Deposited Graphene Films

Hsin Yi Lai, Bin Hao Chen, Hsiu Hao Hsu

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)


This article reports the growth of high-quality AlN films on graphene. The graphene films were synthesized by CVD and then transferred onto silicon substrates. Epitaxial aluminum nitride films were then deposited by DC magnetron sputtering onto intermediate graphene layer readily transferred onto the silicon substrate. The quality and structural characteristics of the graphene and AlN films were carefully inspected. Highly c-axis-oriented AlN crystal structures are observed via XRD patterns.

Original languageEnglish
Pages (from-to)111-116
Number of pages6
JournalJournal of the Chinese Society of Mechanical Engineers, Transactions of the Chinese Institute of Engineers, Series C/Chung-Kuo Chi Hsueh Kung Ch'eng Hsuebo Pao
Issue number2
Publication statusPublished - 2017 Apr 1

All Science Journal Classification (ASJC) codes

  • Mechanical Engineering

Fingerprint Dive into the research topics of 'High-Quality AlN Films Grown on Chemical Vapor-Deposited Graphene Films'. Together they form a unique fingerprint.

Cite this