Abstract
High quality ZnO thin films were deposited onto InP substrates by radio frequency magnetron sputtering. It was found that the characteristics of ZnO film depend on deposition parameters, and a detailed study was performed. By adjusting these parameters, we obtained a ZnO thin film with an extremely sharp x-ray diffraction peak with a 0.183° full width at half-maximum. The resistivity of the deposited ZnO film is 1010 Ω cm and its refractive index is close to that of single crystal ZnO. These results indicate that the quality of these ZnO thin films is acceptable for the fabrication of a surface acoustic wave device on InP substrates.
| Original language | English |
|---|---|
| Pages (from-to) | 381-384 |
| Number of pages | 4 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Volume | 13 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - 1995 Mar |
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films