High-temperature stable HfLaON p-MOSFETs with high-work-function Ir 3Si gate

C. H. Wu, B. F. Hung, Albert Chin, S. J. Wang, X. P. Wang, M. F. Li, C. Zhu, F. Y. Yen, Y. T. Hou, Y. Jin, H. J. Tao, S. C. Chen, M. S. Liang

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Chemical Compounds

Engineering & Materials Science