High-throughput nanofabrication of infra-red and chiral metamaterials using nanospherical-lens lithography

Yun Chorng Chang, Sih Chen Lu, Hsin Chan Chung, Shih Ming Wang, Tzung Da Tsai, Tzung Fang Guo

Research output: Contribution to journalArticlepeer-review

39 Citations (Scopus)


Various infra-red and planar chiral metamaterials were fabricated using the modified Nanospherical-Lens Lithography. By replacing the light source with a hand-held ultraviolet lamp, its asymmetric light emission pattern produces the elliptical-shaped photoresist holes after passing through the spheres. The long axis of the ellipse is parallel to the lamp direction. The fabricated ellipse arrays exhibit localized surface plasmon resonance in mid-infra-red and are ideal platforms for surface enhanced infra-red absorption (SEIRA). We also demonstrate a way to design and fabricate complicated patterns by tuning parameters in each exposure step. This method is both high-throughput and low-cost, which is a powerful tool for future infra-red metamaterials applications.

Original languageEnglish
Article number3339
JournalScientific reports
Publication statusPublished - 2013 Nov 28

All Science Journal Classification (ASJC) codes

  • General


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