High work function IrxSi gates on HfAlON p-MOSFETs

C. H. Wu, D. S. Yu, Albert Chin, S. J. Wang, M. F. Li, C. Zhu, B. F. Hung, S. P. McAlister

Research output: Contribution to journalArticle

18 Citations (Scopus)

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Chemical Compounds

Engineering & Materials Science