Implementation considerations of various virtual metrology algorithms

Yu Chuan Su, Tung Ho Lin, Fan-Tien Cheng, Wei Ming Wu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

7 Citations (Scopus)

Abstract

In the semiconductor industry, run-to-run (R2R) control is an important technique to improve process capability and further enhance the production yield. As the dimension of electronic device shrinks increasingly, wafer-to-wafer (W2W) advanced process control (APC) becomes essential for critical stages. W2W APC needs to obtain the metrology value of each wafer; however, it will be highly time and cost consuming for obtaining actual metrology value of each wafer by physical measurement. Recently, an efficient and cost-effective approach denoted virtual metrology (VM) was proposed to substitute the actual metrology. To implement VM in W2W APC, both conjecture-accuracy and real-time requirements need to be considered. In this paper, various VM algorithms of back-propagation neural network (BPNN), simple recurrent neural network (SRNN) and multiple regression (MR) are evaluated to see whether they can meet the accuracy and real-time requirements of W2W APC or not. The fifth-generation TFT-LCD CVD process is used to test and verify the requirements. Test results show that both one-hidden-layered BPNN and SRNN VM algorithms can achieve acceptable conjecture accuracy and meet the real-time requirements of semiconductor and TFT-LCD W2W APC applications.

Original languageEnglish
Title of host publicationProceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007
Pages276-281
Number of pages6
DOIs
Publication statusPublished - 2007
Event3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007 - Scottsdale, AZ, United States
Duration: 2007 Sep 222007 Sep 25

Other

Other3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007
CountryUnited States
CityScottsdale, AZ
Period07-09-2207-09-25

Fingerprint

Process control
Recurrent neural networks
Liquid crystal displays
Backpropagation
Semiconductor materials
Neural networks
Costs
Chemical vapor deposition
Industry

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

Cite this

Su, Y. C., Lin, T. H., Cheng, F-T., & Wu, W. M. (2007). Implementation considerations of various virtual metrology algorithms. In Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007 (pp. 276-281). [4341740] https://doi.org/10.1109/COASE.2007.4341740
Su, Yu Chuan ; Lin, Tung Ho ; Cheng, Fan-Tien ; Wu, Wei Ming. / Implementation considerations of various virtual metrology algorithms. Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007. 2007. pp. 276-281
@inproceedings{fe7e88105857469a89392cef1cf84b96,
title = "Implementation considerations of various virtual metrology algorithms",
abstract = "In the semiconductor industry, run-to-run (R2R) control is an important technique to improve process capability and further enhance the production yield. As the dimension of electronic device shrinks increasingly, wafer-to-wafer (W2W) advanced process control (APC) becomes essential for critical stages. W2W APC needs to obtain the metrology value of each wafer; however, it will be highly time and cost consuming for obtaining actual metrology value of each wafer by physical measurement. Recently, an efficient and cost-effective approach denoted virtual metrology (VM) was proposed to substitute the actual metrology. To implement VM in W2W APC, both conjecture-accuracy and real-time requirements need to be considered. In this paper, various VM algorithms of back-propagation neural network (BPNN), simple recurrent neural network (SRNN) and multiple regression (MR) are evaluated to see whether they can meet the accuracy and real-time requirements of W2W APC or not. The fifth-generation TFT-LCD CVD process is used to test and verify the requirements. Test results show that both one-hidden-layered BPNN and SRNN VM algorithms can achieve acceptable conjecture accuracy and meet the real-time requirements of semiconductor and TFT-LCD W2W APC applications.",
author = "Su, {Yu Chuan} and Lin, {Tung Ho} and Fan-Tien Cheng and Wu, {Wei Ming}",
year = "2007",
doi = "10.1109/COASE.2007.4341740",
language = "English",
isbn = "1424411548",
pages = "276--281",
booktitle = "Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007",

}

Su, YC, Lin, TH, Cheng, F-T & Wu, WM 2007, Implementation considerations of various virtual metrology algorithms. in Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007., 4341740, pp. 276-281, 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007, Scottsdale, AZ, United States, 07-09-22. https://doi.org/10.1109/COASE.2007.4341740

Implementation considerations of various virtual metrology algorithms. / Su, Yu Chuan; Lin, Tung Ho; Cheng, Fan-Tien; Wu, Wei Ming.

Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007. 2007. p. 276-281 4341740.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - Implementation considerations of various virtual metrology algorithms

AU - Su, Yu Chuan

AU - Lin, Tung Ho

AU - Cheng, Fan-Tien

AU - Wu, Wei Ming

PY - 2007

Y1 - 2007

N2 - In the semiconductor industry, run-to-run (R2R) control is an important technique to improve process capability and further enhance the production yield. As the dimension of electronic device shrinks increasingly, wafer-to-wafer (W2W) advanced process control (APC) becomes essential for critical stages. W2W APC needs to obtain the metrology value of each wafer; however, it will be highly time and cost consuming for obtaining actual metrology value of each wafer by physical measurement. Recently, an efficient and cost-effective approach denoted virtual metrology (VM) was proposed to substitute the actual metrology. To implement VM in W2W APC, both conjecture-accuracy and real-time requirements need to be considered. In this paper, various VM algorithms of back-propagation neural network (BPNN), simple recurrent neural network (SRNN) and multiple regression (MR) are evaluated to see whether they can meet the accuracy and real-time requirements of W2W APC or not. The fifth-generation TFT-LCD CVD process is used to test and verify the requirements. Test results show that both one-hidden-layered BPNN and SRNN VM algorithms can achieve acceptable conjecture accuracy and meet the real-time requirements of semiconductor and TFT-LCD W2W APC applications.

AB - In the semiconductor industry, run-to-run (R2R) control is an important technique to improve process capability and further enhance the production yield. As the dimension of electronic device shrinks increasingly, wafer-to-wafer (W2W) advanced process control (APC) becomes essential for critical stages. W2W APC needs to obtain the metrology value of each wafer; however, it will be highly time and cost consuming for obtaining actual metrology value of each wafer by physical measurement. Recently, an efficient and cost-effective approach denoted virtual metrology (VM) was proposed to substitute the actual metrology. To implement VM in W2W APC, both conjecture-accuracy and real-time requirements need to be considered. In this paper, various VM algorithms of back-propagation neural network (BPNN), simple recurrent neural network (SRNN) and multiple regression (MR) are evaluated to see whether they can meet the accuracy and real-time requirements of W2W APC or not. The fifth-generation TFT-LCD CVD process is used to test and verify the requirements. Test results show that both one-hidden-layered BPNN and SRNN VM algorithms can achieve acceptable conjecture accuracy and meet the real-time requirements of semiconductor and TFT-LCD W2W APC applications.

UR - http://www.scopus.com/inward/record.url?scp=44449086000&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=44449086000&partnerID=8YFLogxK

U2 - 10.1109/COASE.2007.4341740

DO - 10.1109/COASE.2007.4341740

M3 - Conference contribution

SN - 1424411548

SN - 9781424411542

SP - 276

EP - 281

BT - Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007

ER -

Su YC, Lin TH, Cheng F-T, Wu WM. Implementation considerations of various virtual metrology algorithms. In Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007. 2007. p. 276-281. 4341740 https://doi.org/10.1109/COASE.2007.4341740