TY - GEN
T1 - Importance of data quality in virtual metrology
AU - Huang, Yi Ting
AU - Cheng, Fan Tien
AU - Chen, Yeh Tung
PY - 2006
Y1 - 2006
N2 - The purpose of VM is to enable the manufacturers to conjecture the wafer quality and deduce the causes of defects without performing physical metrology. VM requires a large amount of sensor data retrieved from production tools. However, inappropriateness and instability of the data collection system, which leads to incorrectness, fragment and asynchrony of data collected, may lead to inaccurate conjecture results. Hence, not only precision of the VM conjecture module but also quality of the collected data are essential to ensure accurate and stable VM results for improving production yield. In this work, the importance of data quality to VM is investigated. The data quality mechanism is proposed for data characteristic analysis, data anomaly detection, data cleaning, data normalization, and data reduction. Besides, the equipment of semiconductor chemical vapor deposition (CVD) is adopted as a practical example to illustrate the significance of data quality mechanism, and further verify feasibility and effectiveness of VM.
AB - The purpose of VM is to enable the manufacturers to conjecture the wafer quality and deduce the causes of defects without performing physical metrology. VM requires a large amount of sensor data retrieved from production tools. However, inappropriateness and instability of the data collection system, which leads to incorrectness, fragment and asynchrony of data collected, may lead to inaccurate conjecture results. Hence, not only precision of the VM conjecture module but also quality of the collected data are essential to ensure accurate and stable VM results for improving production yield. In this work, the importance of data quality to VM is investigated. The data quality mechanism is proposed for data characteristic analysis, data anomaly detection, data cleaning, data normalization, and data reduction. Besides, the equipment of semiconductor chemical vapor deposition (CVD) is adopted as a practical example to illustrate the significance of data quality mechanism, and further verify feasibility and effectiveness of VM.
UR - http://www.scopus.com/inward/record.url?scp=50249154417&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=50249154417&partnerID=8YFLogxK
U2 - 10.1109/IECON.2006.347318
DO - 10.1109/IECON.2006.347318
M3 - Conference contribution
AN - SCOPUS:50249154417
SN - 1424401364
SN - 9781424401369
T3 - IECON Proceedings (Industrial Electronics Conference)
SP - 3727
EP - 3732
BT - IECON 2006 - 32nd Annual Conference on IEEE Industrial Electronics
T2 - IECON 2006 - 32nd Annual Conference on IEEE Industrial Electronics
Y2 - 6 November 2006 through 10 November 2006
ER -