Imprint lithography for flexible transparent plastic substrates

Wen Chang Liao, Steve Lien Chung Hsu, Sheng Yuan Chu, Po Ching Kau

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

Abstract

A novel imprinting process has been developed for the use of resist pattern transfer on flexible transparent plastic substrates. The polymer resist was first spin-coated on the mold, which was treated with a release agent. After softbaking, the resist layer was attached to a plastic substrate coated with an adhesive. The patterns were completely transferred to the substrate after removing the mold. Using this method, we were able to obtain the desired patterns on the plastic substrate without heating the substrate, which could deform the substrate.

Original languageEnglish
Pages (from-to)145-148
Number of pages4
JournalMicroelectronic Engineering
Volume75
Issue number2
DOIs
Publication statusPublished - 2004 Jul 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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