Imprint lithography utilizing silated acidic polymers

Franklin Chau-Nan Hong (Inventor), Lien-Chung Hsu (Inventor)

Research output: Patent

Abstract

本發明係為一以矽化酸性高分子材料之壓印圖案轉移製程,利用包含酸性單體及矽單體之數種單體以共聚合方式合成出高分子阻劑,將高分子阻劑塗佈於基材上進行熱壓印圖形轉移製程時,由於高分子阻劑為酸性矽化聚合物,可利用環保型鹼性水溶液之去阻劑去除,而不需使用昂貴之乾式蝕刻或有機溶劑移除,可加速製程並降低基台耗損及物料成本。
Original languageEnglish
Patent numberI296355
Publication statusPublished - 1800

Cite this

Hong, F. C-N., & Hsu, L-C. (1800). Imprint lithography utilizing silated acidic polymers. (Patent No. I296355).