Imprint lithography utilizing silated acidic polymers

Franklin Chau-Nan Hong (Inventor), Lien-Chung Hsu (Inventor)

Research output: Patent


A synthesis for a silated acidic polymer by a copolymerization of several monomers includes one acidic monomer and one silated monomer. The silated acidic polymer is used as a resist barrier in imprint lithography and is easily removed by an environmental basic aqua-solution during the stripping process without using RIE (reactive ion etching) process or organic solvent at the last step of resist stripping so that the throughput is enhanced and good etching resistibility together with cost-saving is obtained.
Translated title of the contribution以矽化酸性高分子材料之壓印圖案轉移製程
Original languageEnglish
Patent number7618574
Publication statusPublished - 2007 Jan 18

Fingerprint Dive into the research topics of 'Imprint lithography utilizing silated acidic polymers'. Together they form a unique fingerprint.

Cite this