Imprint lithography utilizing silated acidic polymers

Franklin Chau-Nan Hong (Inventor), Lien-Chung Hsu (Inventor)

Research output: Patent

Abstract

A synthesis for a silated acidic polymer by a copolymerization of several monomers includes one acidic monomer and one silated monomer. The silated acidic polymer is used as a resist barrier in imprint lithography and is easily removed by an environmental basic aqua-solution during the stripping process without using RIE (reactive ion etching) process or organic solvent at the last step of resist stripping so that the throughput is enhanced and good etching resistibility together with cost-saving is obtained.
Original languageEnglish
Patent number7618574
Publication statusPublished - 2007 Jan 18

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Hong, F. C-N., & Hsu, L-C. (2007). Imprint lithography utilizing silated acidic polymers. (Patent No. 7618574).