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Improved GaAs/In
0.25
Ga
0.75
As/GaAs pseudomorphic heterostructure by growing double δ-doping GaAs layers on both sides of the channel
H. M. Shieh,
Wei-Chou Hsu
, C. L. Wu
Institute of Microelectronics
Master Degree Program on Nano-Integrated-Circuit Engineering
Research output
:
Contribution to journal
›
Article
›
peer-review
1
Citation (Scopus)
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Dive into the research topics of 'Improved GaAs/In
0.25
Ga
0.75
As/GaAs pseudomorphic heterostructure by growing double δ-doping GaAs layers on both sides of the channel'. Together they form a unique fingerprint.
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Engineering & Materials Science
Two dimensional electron gas
100%
Heterojunctions
74%
Transconductance
68%
Doping (additives)
63%
Low pressure chemical vapor deposition
46%
Metallorganic chemical vapor deposition
44%
Electron mobility
44%
High electron mobility transistors
32%
Current density
27%
Chemical Compounds
Transconductance
87%
Two-Dimensional Electron Gas
50%
Electron Mobility
34%
Field Effect
28%
Chemical Vapour Deposition
25%
Current Density
20%
Length
17%
Physics & Astronomy
transconductance
62%
electron mobility
29%
electron gas
27%
metalorganic chemical vapor deposition
27%
low pressure
23%
field effect transistors
22%
current density
20%
saturation
19%