Improved OLED device performance by pretreating indium-tin-oxide anode surface with CF4/O2 plasma

I. Min Chan; Weng Cheng Cheng; Franklin C. Hong

Improved OLED device performance by pretreating indium-tin-oxide anode surface with CF4/O₂ plasma

I. Min Chan, Weng Cheng Cheng, Franklin C. Hong

Department of Chemical Engineering

Research output: Contribution to journal › Conference article › peer-review

Abstract

Improved organic light emitting diode (OLED) device performance was analyzed by pretreating indium-tin-oxide (ITO) anode surface with CF₄/O₂ plasma. An intense electroluminescence (EL) emission was observed at a much lower applied voltage and the device turn-on-voltage was reduced. Chemical compositions of various plasma-treated ITO surfaces showed that the CF₄/O₂ plasma treatment was an effective method to remove the contaminants from the ITO surfaces.

Original language	English
Pages (from-to)	1483-1486
Number of pages	4
Journal	SID Conference Record of the International Display Research Conference
Publication status	Published - 2001
Event	Asia Display/IDW 2001 - Nagoya, Japan Duration: 2002 Oct 16 → 2002 Oct 19

All Science Journal Classification (ASJC) codes

Electrical and Electronic Engineering

Cite this

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title = "Improved OLED device performance by pretreating indium-tin-oxide anode surface with CF4/O2 plasma",

abstract = "Improved organic light emitting diode (OLED) device performance was analyzed by pretreating indium-tin-oxide (ITO) anode surface with CF4/O2 plasma. An intense electroluminescence (EL) emission was observed at a much lower applied voltage and the device turn-on-voltage was reduced. Chemical compositions of various plasma-treated ITO surfaces showed that the CF4/O2 plasma treatment was an effective method to remove the contaminants from the ITO surfaces.",

author = "Chan, {I. Min} and Cheng, {Weng Cheng} and Hong, {Franklin C.}",

year = "2001",

language = "English",

pages = "1483--1486",

journal = "SID Conference Record of the International Display Research Conference",

issn = "1083-1312",

publisher = "Society for Information Display",

note = "Asia Display/IDW 2001 ; Conference date: 16-10-2002 Through 19-10-2002",

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T1 - Improved OLED device performance by pretreating indium-tin-oxide anode surface with CF4/O2 plasma

AU - Chan, I. Min

AU - Cheng, Weng Cheng

AU - Hong, Franklin C.

PY - 2001

Y1 - 2001

N2 - Improved organic light emitting diode (OLED) device performance was analyzed by pretreating indium-tin-oxide (ITO) anode surface with CF4/O2 plasma. An intense electroluminescence (EL) emission was observed at a much lower applied voltage and the device turn-on-voltage was reduced. Chemical compositions of various plasma-treated ITO surfaces showed that the CF4/O2 plasma treatment was an effective method to remove the contaminants from the ITO surfaces.

AB - Improved organic light emitting diode (OLED) device performance was analyzed by pretreating indium-tin-oxide (ITO) anode surface with CF4/O2 plasma. An intense electroluminescence (EL) emission was observed at a much lower applied voltage and the device turn-on-voltage was reduced. Chemical compositions of various plasma-treated ITO surfaces showed that the CF4/O2 plasma treatment was an effective method to remove the contaminants from the ITO surfaces.

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UR - http://www.scopus.com/inward/citedby.url?scp=0035782735&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0035782735

SN - 1083-1312

SP - 1483

EP - 1486

JO - SID Conference Record of the International Display Research Conference

JF - SID Conference Record of the International Display Research Conference

T2 - Asia Display/IDW 2001

Y2 - 16 October 2002 through 19 October 2002

ER -

Improved OLED device performance by pretreating indium-tin-oxide anode surface with CF4/O₂ plasma

Abstract

All Science Journal Classification (ASJC) codes

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