In Situ Synchrotron X-ray Diffraction Measurement of the Strain Distribution in Si Die for the Embedded Substrates

Hsueh Hsien Hsu, Hao Chen, Yao Tsung Ouyang, Tz Cheng Chiu, Tao Chih Chang, Hsin Yi Lee, Chin Shun Ku, Albert T. Wu

Research output: Contribution to journalArticlepeer-review

Abstract

Three-dimensional packaging provides an acceptable solution for miniaturized integrated circuits. Because of the technological flexibility required for combining various modules to form a functional system, miniaturization can be achieved by using embedded techniques that could enhance the reliability of assembled systems. Because the mismatch of the thermal expansion coefficient among the materials has been an emerging issue when embedded components are subjected to thermal cycles, this study adopted the in situ synchrotron x-ray method to measure the strain distribution of a Si die in embedded substrates at various temperatures ranging from 25°C to 150°C. The out-of-plane strain of the Si die became less compressive when the temperature was increased. The numerical simulation of the finite elements software ANSYS also indicated the similar consequence of the strain behavior.

Original languageEnglish
Pages (from-to)3942-3947
Number of pages6
JournalJournal of Electronic Materials
Volume44
Issue number10
DOIs
Publication statusPublished - 2015 Oct 5

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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