@article{6478eec56c72403eb606b84e96c41704,
title = "Influence of substrate bias on practical adhesion, toughness, and roughness of reactive de-sputtered zirconium nitride films",
author = "Chen, {Cheng Shi} and Liu, {Chuan Pu} and Yang, {Heng Ghieh} and Tsao, {C. Y.A.}",
note = "Funding Information: The work is supported by the NSC, Taiwan under Project No. NSC89-2218-E006-153. We are also grateful for the use of the sputter equipment in the Semiconductor Laboratory, which is supported and maintained by the Department of Materials Science and Engineering at National Cheng-Kung University, Taiwan. Additionally, the authors wish to thank H. L. Chen and Y. Z. Lin for helpful discussions.",
year = "2004",
month = oct,
day = "1",
doi = "10.1116/1.1782635",
language = "English",
volume = "22",
pages = "2041--2047",
journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "5",
}