Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes

K. Ohmori, P. Ahmet, K. Shiraishi, H. Watanabe, Y. Akasaka, K. Yamabe, M. Yoshitake, Kao-Shuo Chang, M. L. Green, K. Yamada, T. Chikyow

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publication1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006
Pages160-162
Number of pages3
DOIs
Publication statusPublished - 2006 Dec 1
Event1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006 - Mishima, Shizuoka, Japan
Duration: 2006 Jan 302006 Feb 1

Publication series

Name2006 International Workshop on Nano CMOS - Proceedings, IWNC

Other

Other1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006
CountryJapan
CityMishima, Shizuoka
Period06-01-3006-02-01

Fingerprint

Annealing
Electrodes
Electric potential
Metals

All Science Journal Classification (ASJC) codes

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Cite this

Ohmori, K., Ahmet, P., Shiraishi, K., Watanabe, H., Akasaka, Y., Yamabe, K., ... Chikyow, T. (2006). Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes. In 1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006 (pp. 160-162). [4570988] (2006 International Workshop on Nano CMOS - Proceedings, IWNC). https://doi.org/10.1109/IWNC.2006.4570988
Ohmori, K. ; Ahmet, P. ; Shiraishi, K. ; Watanabe, H. ; Akasaka, Y. ; Yamabe, K. ; Yoshitake, M. ; Chang, Kao-Shuo ; Green, M. L. ; Yamada, K. ; Chikyow, T. / Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes. 1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006. 2006. pp. 160-162 (2006 International Workshop on Nano CMOS - Proceedings, IWNC).
@inproceedings{f7c6dad8a6d8478891c1fb9bbdaf28b9,
title = "Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes",
author = "K. Ohmori and P. Ahmet and K. Shiraishi and H. Watanabe and Y. Akasaka and K. Yamabe and M. Yoshitake and Kao-Shuo Chang and Green, {M. L.} and K. Yamada and T. Chikyow",
year = "2006",
month = "12",
day = "1",
doi = "10.1109/IWNC.2006.4570988",
language = "English",
isbn = "142440603X",
series = "2006 International Workshop on Nano CMOS - Proceedings, IWNC",
pages = "160--162",
booktitle = "1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006",

}

Ohmori, K, Ahmet, P, Shiraishi, K, Watanabe, H, Akasaka, Y, Yamabe, K, Yoshitake, M, Chang, K-S, Green, ML, Yamada, K & Chikyow, T 2006, Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes. in 1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006., 4570988, 2006 International Workshop on Nano CMOS - Proceedings, IWNC, pp. 160-162, 1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006, Mishima, Shizuoka, Japan, 06-01-30. https://doi.org/10.1109/IWNC.2006.4570988

Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes. / Ohmori, K.; Ahmet, P.; Shiraishi, K.; Watanabe, H.; Akasaka, Y.; Yamabe, K.; Yoshitake, M.; Chang, Kao-Shuo; Green, M. L.; Yamada, K.; Chikyow, T.

1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006. 2006. p. 160-162 4570988 (2006 International Workshop on Nano CMOS - Proceedings, IWNC).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes

AU - Ohmori, K.

AU - Ahmet, P.

AU - Shiraishi, K.

AU - Watanabe, H.

AU - Akasaka, Y.

AU - Yamabe, K.

AU - Yoshitake, M.

AU - Chang, Kao-Shuo

AU - Green, M. L.

AU - Yamada, K.

AU - Chikyow, T.

PY - 2006/12/1

Y1 - 2006/12/1

UR - http://www.scopus.com/inward/record.url?scp=52149122933&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=52149122933&partnerID=8YFLogxK

U2 - 10.1109/IWNC.2006.4570988

DO - 10.1109/IWNC.2006.4570988

M3 - Conference contribution

AN - SCOPUS:52149122933

SN - 142440603X

SN - 9781424406036

T3 - 2006 International Workshop on Nano CMOS - Proceedings, IWNC

SP - 160

EP - 162

BT - 1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006

ER -

Ohmori K, Ahmet P, Shiraishi K, Watanabe H, Akasaka Y, Yamabe K et al. Influences of annealing conditions on flatband voltage properties using continuously workfunction-tuned metal electrodes. In 1st IEEE International Workshop on Nano CMOS, IEEE IWNC 2006. 2006. p. 160-162. 4570988. (2006 International Workshop on Nano CMOS - Proceedings, IWNC). https://doi.org/10.1109/IWNC.2006.4570988