InGaP/InGaAs dual-channel transistor

Hung Ming Chuang, Chii Maw Uang, Shiou Ying Cheng, Chun Yuan Chen, Po Hsien Lai, Chung I. Kao, Yan Ying Tsai, Wei Hsi Hsu, Wen Chau Liu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

An interesting InGaP/InGaAs heterostructure field-effect transistor utilizing dual δ-doped quantum wells as double channels is studied and demonstrated. The employed dual δ-doped quantum wells and InGaP layer provide good carrier confinement and Schottky behavior, respectively. Good device performances including higher turn-on and breakdown voltages, high and linear transconductance and RF properties are obtained. For a 1×100μm device, turn-on voltage of 1.74 V, maximum output current of 499 mA/mm, and maximum transconductance of 162 mS/mm with 303 mA/mm broad operation regime are obtained. The microwave properties of fx and fmax are 16 and 32.3 GHz, respectively. Furthermore, even the device is operated at higher temperature regime (>400K), insignificant degradations of DC and RF performances are observed.

Original languageEnglish
Title of host publicationExtended Abstracts of the Fourth International Workshop on Junction Technology, IWJT 2004
EditorsX.P. Qu, G.P. Ru, B.Z. Li, B. Mizuno, H. Iwai
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages186-189
Number of pages4
Volume4
ISBN (Print)7309039157
Publication statusPublished - 2004
EventExtended Abstracts of the Fourth International Workshop on Junction Technology, IWJT 2004 - Shanghai, China
Duration: 2004 Mar 152004 Mar 16

Other

OtherExtended Abstracts of the Fourth International Workshop on Junction Technology, IWJT 2004
Country/TerritoryChina
CityShanghai
Period04-03-1504-03-16

All Science Journal Classification (ASJC) codes

  • General Engineering

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