Abstract
An interesting InGaP/InGaAs heterostructure field-effect transistor utilizing dual δ-doped quantum wells as double channels is studied and demonstrated. The employed dual δ-doped quantum wells and InGaP layer provide good carrier confinement and Schottky behavior, respectively. Good device performances including higher turn-on and breakdown voltages, high and linear transconductance and RF properties are obtained. For a 1×100μm device, turn-on voltage of 1.74 V, maximum output current of 499 mA/mm, and maximum transconductance of 162 mS/mm with 303 mA/mm broad operation regime are obtained. The microwave properties of fx and fmax are 16 and 32.3 GHz, respectively. Furthermore, even the device is operated at higher temperature regime (>400K), insignificant degradations of DC and RF performances are observed.
Original language | English |
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Title of host publication | Extended Abstracts of the Fourth International Workshop on Junction Technology, IWJT 2004 |
Editors | X.P. Qu, G.P. Ru, B.Z. Li, B. Mizuno, H. Iwai |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 186-189 |
Number of pages | 4 |
Volume | 4 |
ISBN (Print) | 7309039157 |
Publication status | Published - 2004 |
Event | Extended Abstracts of the Fourth International Workshop on Junction Technology, IWJT 2004 - Shanghai, China Duration: 2004 Mar 15 → 2004 Mar 16 |
Other
Other | Extended Abstracts of the Fourth International Workshop on Junction Technology, IWJT 2004 |
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Country/Territory | China |
City | Shanghai |
Period | 04-03-15 → 04-03-16 |
All Science Journal Classification (ASJC) codes
- General Engineering