InGaP/InGaAs/GaAs double channel pseudomorphic high electron mobility transistor

H. M. Chuang, K. H. Yu, K. W. Lin, C. C. Cheng, J. Y. Chen, W. C. Liu

Research output: Contribution to journalConference articlepeer-review

Abstract

The device characteristics of a novel InGaP/InGaAs/GaAs double channel pseudomorphic high electron mobility transistor (PHEMT) are reported. The double InGaAs layers are used to increase the total channel thickness. Experimentally, a flat and wide transconductance and microwave operation regimes over 300 mA/mm are obtained. In addition, the compression of transconductance and frequency response are insignificant even operated at high forward gate-source voltage of +2.0V. Therefore, the studied device provides the promise for microwave circuit applications.

Original languageEnglish
Pages (from-to)271-274
Number of pages4
JournalInstitute of Physics Conference Series
Volume174
Publication statusPublished - 2003
EventCompound Semiconductors 2002 - Proceedings of the Twenty-Ninth International Symposium on Compound Semiconductors - Lausanne, Switzerland
Duration: 2002 Oct 72002 Oct 10

All Science Journal Classification (ASJC) codes

  • General Physics and Astronomy

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