Abstract
The device characteristics of a novel InGaP/InGaAs/GaAs double channel pseudomorphic high electron mobility transistor (PHEMT) are reported. The double InGaAs layers are used to increase the total channel thickness. Experimentally, a flat and wide transconductance and microwave operation regimes over 300 mA/mm are obtained. In addition, the compression of transconductance and frequency response are insignificant even operated at high forward gate-source voltage of +2.0V. Therefore, the studied device provides the promise for microwave circuit applications.
Original language | English |
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Pages (from-to) | 271-274 |
Number of pages | 4 |
Journal | Institute of Physics Conference Series |
Volume | 174 |
Publication status | Published - 2003 |
Event | Compound Semiconductors 2002 - Proceedings of the Twenty-Ninth International Symposium on Compound Semiconductors - Lausanne, Switzerland Duration: 2002 Oct 7 → 2002 Oct 10 |
All Science Journal Classification (ASJC) codes
- General Physics and Astronomy