Integrated facility layout and material handling system design in semiconductor fabrication facilities

Brett A. Peters, Taho Yang

Research output: Contribution to journalArticlepeer-review

90 Citations (Scopus)

Abstract

Semiconductor manufacturing is an important component of the U.S. manufacturing industry. Most of today's fabrication facilities and those being designed for the near future use a bay layout configuration and an overhead monorail system for moving material between bays. These material handling systems are usually designed with a spine or perimeter type of configuration. This paper investigates the layout and material handling system design integration problem in semiconductor fabrication facilities and proposes a methodology for solving this integrated design problem. A spacefilling curve approach is used to address the facility layout, while the structure of the spine and perimeter configurations are exploited to create a network flow problem to determine the material handling system design. Computational results are presented and show exceptional promise for this procedure in solving the integrated design problem in a semiconductor manufacturing environment.

Original languageEnglish
Pages (from-to)360-369
Number of pages10
JournalIEEE Transactions on Semiconductor Manufacturing
Volume10
Issue number3
DOIs
Publication statusPublished - 1997

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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